Paper
2 December 1992 High-performance surface-emitting lasers with dry-etched facets
Szutsun Simon Ou, Michael Jansen, Jane J. Yang, Moshe Sergant, Luke J. Mawst, Dan Botez, Thomas J. Roth, Cynthia A. Hess, Chan Tu
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Abstract
The fabrication, performance characteristics, and applications of monolithic in-plane surface-emitting lasers (IPSELs) with dry-etched 45-degree micromirrors are reviewed. Several types of such laser diode structures in both junction-up and junction-down configurations are considered. The performance goals for IPSELs with 45-degree micromirrors are high power and efficiency, high duty cycle and CW operation, good reliability, and high fabrication yields. The proposed approach for achieving these goals includes uniform quantum well material growth and dry etching of the laser micromirrors with tight fabrication tolerances.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Szutsun Simon Ou, Michael Jansen, Jane J. Yang, Moshe Sergant, Luke J. Mawst, Dan Botez, Thomas J. Roth, Cynthia A. Hess, and Chan Tu "High-performance surface-emitting lasers with dry-etched facets", Proc. SPIE 1703, Optical Technology for Microwave Applications VI and Optoelectronic Signal Processing for Phased-Array Antennas III, (2 December 1992); https://doi.org/10.1117/12.138375
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KEYWORDS
Micromirrors

Etching

Reactive ion etching

Semiconductor lasers

Gallium arsenide

Mirrors

Quantum wells

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