Wavelength tuning for optimization of deep-UV excimer laser performance

Susan K. Jones; Elliott Sean Capsuto; Bruce W. Dudley; Charles R. Peters; Gary C. Escher

doi:10.1117/12.130345

1 June 1992 Wavelength tuning for optimization of deep-UV excimer laser performance

Susan K. Jones, Elliott Sean Capsuto, Bruce W. Dudley, Charles R. Peters, Gary C. Escher

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130345
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

Experiments were performed to quantify the central laser wavelength setting which provided optimum imaging performance for two generations of deep UV steppers: GCA ALS Laserstep and GCA XLS Laserstep. Significant performance enhancements resulted by adjusting the central wavelength setting of the ALS system by -0.23 nm from the original baseline wavelength (point of minimum distortion). The baseline wavelength of the more advanced lens of the XLS system was closer to optimum, with acceptable imaging performance parameters over a >0.04 nm band. Lens characterization methodologies are described.

Citation Download Citation

Susan K. Jones, Elliott Sean Capsuto, Bruce W. Dudley, Charles R. Peters, and Gary C. Escher "Wavelength tuning for optimization of deep-UV excimer laser performance", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130345

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