New process technology for CD control in deep-submicron optical lithography

Aritoshi Sugimoto; Osamu Suga; Kazuyuki Suko; Hitoshi Arakawa

doi:10.1117/12.130317

1 June 1992 New process technology for CD control in deep-submicron optical lithography

Aritoshi Sugimoto, Osamu Suga, Kazuyuki Suko, Hitoshi Arakawa

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130317
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

An effective and practical control technology of critical dimensions for submicron VSLI is presented. An ARCOR (Anti-Reflective Coating On Resist) process was improved, which is applied as a transparent type anti-reflective coating. A water soluble and low refractive index film was developed for this purpose. The following five items were measured experimentally and discussed : (1) amplitude of swing curve's dependence on resist thickness, (2) thickness latitude of the ARCOR film, (3) photo speed, (4) CD variations in a submicron DRAM and (5) alignment accuracy with a bright field alignment system.

Citation Download Citation

Aritoshi Sugimoto, Osamu Suga, Kazuyuki Suko, and Hitoshi Arakawa "New process technology for CD control in deep-submicron optical lithography", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130317

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