Narrow band KrF excimer laser for mass production of ULSI ICs

Hakaru Mizoguchi; Osamu Wakabayashi; Noritoshi Ito; Masahiko Kowaka; Junichi Fujimoto; Yukio Kobayashi; Takanobu Ishihara; Yoshiho Amada; Yasuhiro Nozue

doi:10.1117/12.130349

1 June 1992 Narrow band KrF excimer laser for mass production of ULSI ICs

Hakaru Mizoguchi, Osamu Wakabayashi, Noritoshi Ito, Masahiko Kowaka, Junichi Fujimoto, Yukio Kobayashi, Takanobu Ishihara, Yoshiho Amada, Yasuhiro Nozue

Author Affiliations +

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130349
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

A narrow band KrF excimer laser system for lithography has been developed. Its durability has been proved up to 2 billion shots that correspond to one year operation in mass production line. The system has kept the average power of 6W with the power stability within +- 3% and the spectral line-width 1.2 pm (FWHM) with the wavelength stability within +- 0.2 pm. The integration of the spectrum has indicated that 95% of the spectral energy lay inside 4.6 pm band during 2 billion shots

Citation Download Citation

Hakaru Mizoguchi, Osamu Wakabayashi, Noritoshi Ito, Masahiko Kowaka, Junichi Fujimoto, Yukio Kobayashi, Takanobu Ishihara, Yoshiho Amada, and Yasuhiro Nozue "Narrow band KrF excimer laser for mass production of ULSI ICs", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130349

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