Modeling of optical images in resists by vector potentials

Hiroyoshi Tanabe

doi:10.1117/12.130360

1 June 1992 Modeling of optical images in resists by vector potentials

Hiroyoshi Tanabe

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130360
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

A new model is presented to calculate the electromagnetic fields inside a resist according to vector potentials. The model can handle three-dimensional electromagnetic fields with fewer variables than Maxwell’s equation. The perturbation theory is applied to this model to describe the resist bleaching process.

Citation Download Citation

Hiroyoshi Tanabe "Modeling of optical images in resists by vector potentials", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130360

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available