Paper
1 June 1992 Fabrication and evaluation of chromium/phase-shifter/quartz structure phase-shift mask
Tadao Yasuzato, Haruo Iwasaki, Hiroshi Nozue, Kunihiko Kasama
Author Affiliations +
Abstract
The deviation of phase shift angle from 180° seriously deteriorates the focus latitude. In order to obtain the expected performance of phase shift mask, a Chromium(Cr)/Phase-Shifter/Quartz(Qz) structure is investigated. In this phase shift mask structure, the shifter thickness i.e., phase shift angle, can be precisely controlled, compared with a conventional Shifter/Cr/Qz structure. Spin-on-grass(SOG) is used as the phase shifter material because of its excellent thickness uniformity. Alternating phase shift mask that has the Cr/SOG/Qz structure was fabricated using Ar-laser writing method, and evaluated using a NA=0.45, 6=0.3-0.5,I-line stepper. Obtained results show that this phase shift mask structure is very promising for the subhalfmicron pattern formation.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tadao Yasuzato, Haruo Iwasaki, Hiroshi Nozue, and Kunihiko Kasama "Fabrication and evaluation of chromium/phase-shifter/quartz structure phase-shift mask", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130324
Lens.org Logo
CITATIONS
Cited by 4 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Phase shifts

Photomasks

Chromium

Optical lithography

Chlorine

Semiconducting wafers

Photoresist processing

RELATED CONTENT

Mask error enhancement factor
Proceedings of SPIE (February 03 2000)
Phase-defocus windows for alternating phase shifting mask
Proceedings of SPIE (December 06 2004)
170 nm gates fabricated by phase shift mask and top...
Proceedings of SPIE (August 08 1993)
Fabrication of phase-shifting mask
Proceedings of SPIE (July 01 1991)
Proximity effects of alternating phase-shift masks
Proceedings of SPIE (December 30 1999)

Back to Top