Paper
1 June 1992 Structural effects of NQD PAC and novolak resin on resist performance
Hiroaki Nemoto, Katsumi Inomata, Toshiyuki Ota, Yoshiji Yumoto, Takao Miura, Hitoshi Chawanya
Author Affiliations +
Abstract
The naphthoquinonediazide (NQD) proximity and the hydrophobicity of a variety of trifunctional NQD-PACs (photoactive compounds) were quantified and the relationship between them and some resist dissolution characteristics was investigated. The influence of novolak resin structure on the relationship was also examined. The average distances (L) between the NQD groups in PAC molecules were estimated by means of a MO calculation, and the retention time (RT) in HPLC measurement was used as a measure of the hydrophobicity of the PAC. A new index, LxRT, was found to be linearly correlated to the dissolution inhibition. The linear relationship indicates that the NQD proximity and the hydrophobicity are dominant factors for the dissolution inhibition among many PAC structural factors. A kinetic study for the dissolution of the samples containing an NQD-PAC or some model inhibitors having no NQD moiety strongly suggested the participation of an alkaline catalyzed coupling reaction between the resin and the PAC in the inhibition mechanism. Based on the above findings, a new comprehensive dissolution mechanism is proposed and the molecular design for a high performance resist is discussed.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroaki Nemoto, Katsumi Inomata, Toshiyuki Ota, Yoshiji Yumoto, Takao Miura, and Hitoshi Chawanya "Structural effects of NQD PAC and novolak resin on resist performance", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59761
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KEYWORDS
Picture Archiving and Communication System

Hydrogen

Molecules

Statistical modeling

Lithography

Molybdenum

Phase measurement

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