Optical properties of titania films prepared by ion-assisted deposition

M. Ghanashyam Krishna; K. Narasimharao; Sangeneni Mohan

doi:10.1117/12.60099

29 July 1992 Optical properties of titania films prepared by ion-assisted deposition

M. Ghanashyam Krishna, K. Narasimharao, Sangeneni Mohan

Proceedings Volume 1624, Laser-Induced Damage in Optical Materials: 1991; (1992) https://doi.org/10.1117/12.60099
Event: Laser-Induced Damage in Optical Materials: 1991, 1991, Boulder, CO, United States

Abstract

Thin films of titanium dioxide have been deposited using ion-assisted deposition with oxygen ions produced using: (1) a Heitmann ion source (HIS) for ions with energy less than 100 eV and (2) a broad beam Kaufman ion source (KIS) for ions in the energy range 100 to 500 eV and current densities up to 100 (mu) A/cm². It has been observed that the refractive index of the films increases up to 300 eV and the extinction coefficient only nominally up to 300 eV. The maximum refractive index obtained was 2.49 at an energy of 300 eV and 50 (mu) A/cm² current density. The refractive index of the films deposited using the HIS was lower than those deposited using the KIS. The refractive index of the HIS films increased with increasing substrate temperature with very little change in the extinction coefficient.

Citation Download Citation

M. Ghanashyam Krishna, K. Narasimharao, and Sangeneni Mohan "Optical properties of titania films prepared by ion-assisted deposition", Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); https://doi.org/10.1117/12.60099

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