Alternative to die-to-database mask inspection

Parkson W Chen

doi:10.1117/12.56941

1 January 1992 Alternative to die-to-database mask inspection

Parkson W Chen

Proceedings Volume 1604, 11th Annual BACUS Symposium on Photomask Technology; (1992) https://doi.org/10.1117/12.56941
Event: 11th Annual BACUS Symposium on Photomask Technology, 1991, Sunnyvale, CA, United States

Abstract

Qualification of a reticle is a very important step for a mask shop. For defect inspection, automatic die to die inspection can detect the random defects and the die to database inspection system can detect the missing patterns as well as the pattern placement of the reticle. When die size becomes larger, and the field size of the stepper lens is limited,it is a common practice that only one die is placed on a reticle.

Citation Download Citation

Parkson W Chen "Alternative to die-to-database mask inspection", Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); https://doi.org/10.1117/12.56941

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