Application of photoelastic coating method on elastoplastic stress analysis of rotation disk

Benhan Dong; Penfei Gao; Ju Wang

doi:10.1117/12.49561

1 December 1991 Application of photoelastic coating method on elastoplastic stress analysis of rotation disk

Benhan Dong, Penfei Gao, Ju Wang

Proceedings Volume 1554, Second International Conference on Photomechanics and Speckle Metrology; (1991) https://doi.org/10.1117/12.49561
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

Stress analysis by analytical method has made remarkable progress in recent years as more sophisticated finite-element programs are developed for use with computer. However, there still remains many stress problems that cannot be rationally approached using finite-element analysis and only an experimental stress analysis test on the actual structure or part will provide the quantitative information necessary to achieve a safe reliable design. For example, the detection of local yield, analytical method cannot infallibly predict the occurrence of localized yield since it is random and its exact location is unpredictable.

Citation Download Citation

Benhan Dong, Penfei Gao, and Ju Wang "Application of photoelastic coating method on elastoplastic stress analysis of rotation disk", Proc. SPIE 1554, Second International Conference on Photomechanics and Speckle Metrology, (1 December 1991); https://doi.org/10.1117/12.49561

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