Reactive-flow modeling of the H/NF2/BiF reaction system

Robert Acebal; Jeffrey P. Dansereau; Randy C.R. Jones; Robert J. Malins; H. Schreiber; William S. Smith; S. Taylor; William Anthony Duncan; Stanley P. Patterson

doi:10.1117/12.25989

1 February 1991 Reactive-flow modeling of the H/NF2/BiF reaction system

Robert Acebal, Jeffrey P. Dansereau, Randy C.R. Jones, Robert J. Malins, H. Schreiber, William S. Smith, S. Taylor, William Anthony Duncan, Stanley P. Patterson

Author Affiliations +

Proceedings Volume 1397, 8th Intl Symp on Gas Flow and Chemical Lasers; (1991) https://doi.org/10.1117/12.25989
Event: Eighth International Symposium on Gas-Flow and Chemical Lasers, 1990, Madrid, Spain

Abstract

The H/NF2/BiF system is one of the most promising concepts for high-power short wavelength chemical lasers (SWCL). The preferred approach uses the H + NF2 reaction to efficiently generate NF(a) energy-carrier molecules. These latter species interact with Bi compounds to produce excited BiF. The potential lasing transition is BiF(A-X) emitting near 460 nm. We report in this paper one-dimensional (1-D) reactive-flow modeling of the H/NF2/BiF system. This work supports design of an experimental demonstration of continuous-wave lasing in a supersonic-flow, purely chemical system. The model treats the subsonic plenum, transonic throat, and supersonic expansion regions.

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Robert Acebal, Jeffrey P. Dansereau, Randy C.R. Jones, Robert J. Malins, H. Schreiber, William S. Smith, S. Taylor, William Anthony Duncan, and Stanley P. Patterson "Reactive-flow modeling of the H/NF2/BiF reaction system", Proc. SPIE 1397, 8th Intl Symp on Gas Flow and Chemical Lasers, (1 February 1991); https://doi.org/10.1117/12.25989

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