Fast-injection Langmuir probe for process diagnostic and control

Roger Patrick; Philippe Schoenborn; Stefan Linder; Henry Baltes

doi:10.1117/12.48943

1 March 1991 Fast-injection Langmuir probe for process diagnostic and control

Roger Patrick, Philippe Schoenborn, Stefan Linder, Henry Baltes

Proceedings Volume 1392, Advanced Techniques for Integrated Circuit Processing; (1991) https://doi.org/10.1117/12.48943
Event: Processing Integration, 1990, Santa Clara, CA, United States

Abstract

A commercially available fast injection Langmuir probe system (FILP) has been mounted on a plasma etching tool which is widely used in the semiconductor industry. The FILP has been used to obtain information on fundamental plasma parameters such as density and plasma potential as a function of machine parameters such as pressure, gas composition and power. A study has also been made of the correlation of ion density and silicon dioxide etch rate in a CF4 plasma.

Citation Download Citation

Roger Patrick, Philippe Schoenborn, Stefan Linder, and Henry Baltes "Fast-injection Langmuir probe for process diagnostic and control", Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); https://doi.org/10.1117/12.48943

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