Paper
1 February 1991 Regular doping structures: a Si-based, quantum-well infrared detector
J. Frederick Koch
Author Affiliations +
Proceedings Volume 1362, Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications; (1991) https://doi.org/10.1117/12.24521
Event: Physical Concepts of Materials for Novel Optoelectronic Device Applications, 1990, Aachen, Germany
Abstract
Semiconductor structures are discussed in which the dopant impurities are arranged in an ordered or at least a partially regular manner. Various electronic properties of such arrays are examined, and it is shown how a layer of dopant atoms in silicon acts as a sensitive and tunable IR absorber.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. Frederick Koch "Regular doping structures: a Si-based, quantum-well infrared detector", Proc. SPIE 1362, Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications, (1 February 1991); https://doi.org/10.1117/12.24521
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KEYWORDS
Doping

Electrons

Optoelectronic devices

Chemical species

Infrared radiation

Silicon

Absorption

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