Theoretical distribution of the structural uniformity of the vapor-deposited thin films

Wei Zhang; G. Q. Chang

doi:10.1117/12.22426

1 December 1990 Theoretical distribution of the structural uniformity of the vapor-deposited thin films

Wei Zhang, G. Q. Chang

Proceedings Volume 1324, Modeling of Optical Thin Films II; (1990) https://doi.org/10.1117/12.22426
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

According to the tangent rule, which relates the deposition angle to the growth direction of the columns, which comprise many vapor-deposited thin films, and according to the relative geometric and trigonometric relations between the evaporation source and the substrate, the theoretical distribution formulas describing the uniformity of the colunmar structure are given for four kinds of general fixtures. These distributions have been computed for various conditions. We also analyze and discuss a structural thin-film model, and have concluded that the structure obtained with the rotary spherical fixture is the best of several fixture alternatives.

Citation Download Citation

Wei Zhang and G. Q. Chang "Theoretical distribution of the structural uniformity of the vapor-deposited thin films", Proc. SPIE 1324, Modeling of Optical Thin Films II, (1 December 1990); https://doi.org/10.1117/12.22426

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