Mask performance improvement by pixel level dose correction

Mayuko Matsumoto; Naoki Yoshida; Tetsunori Hirata; Makoto Motegi; Kiyoshi Kageyama; Mitsuharu Yamana; Wataru Kunishima; Ryo Iikubo

doi:10.1117/12.3034611

12 November 2024 Mask performance improvement by pixel level dose correction

Mayuko Matsumoto, Naoki Yoshida, Tetsunori Hirata, Makoto Motegi, Kiyoshi Kageyama, Mitsuharu Yamana, Wataru Kunishima, Ryo Iikubo

Author Affiliations +

Proceedings Volume 13216, Photomask Technology 2024; 132160H (2024) https://doi.org/10.1117/12.3034611
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

Leading edge photomasks require tighter accuracy than ever as wafer lithography advances to EUV and High-NA EUV. To expand process margin by photomask quality improvement, the CD uniformity and the small LER are important. To improve them for small patterns, dose correction as short range correction is more effective than geometry correction. Pixel Level Dose Correction (PLDC) is the dose correction capable of short range correction, and is developed and implemented as inline correction system for multi-beam mask writer MBM series from NuFlare Technology, Inc. To confirm mask quality improvement by PLDC, small patterns are printed on low sensitivity pCAR. 1D line patterns and contact patterns which suffers line edge roughness, showed improvements in LER and LCDU by edge dose enhancement by PLDC. Wafer printability simulation showed that PLDC improved LCDU same as mask patterning.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Mayuko Matsumoto, Naoki Yoshida, Tetsunori Hirata, Makoto Motegi, Kiyoshi Kageyama, Mitsuharu Yamana, Wataru Kunishima, and Ryo Iikubo "Mask performance improvement by pixel level dose correction", Proc. SPIE 13216, Photomask Technology 2024, 132160H (12 November 2024); https://doi.org/10.1117/12.3034611

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