Modelling and compensating proximity effects in massively parallelized multiphoton photoplotter

F. Ogor; T. Le Deun; V. Sedova; J. Rovera; A. Erdmann; M. Flury; K. Heggarty

doi:10.1117/12.3016932

18 June 2024 Modelling and compensating proximity effects in massively parallelized multiphoton photoplotter

F. Ogor, T. Le Deun, V. Sedova, J. Rovera, A. Erdmann, M. Flury, K. Heggarty

Proceedings Volume 12995, 3D Printed Optics and Additive Photonic Manufacturing IV; 1299509 (2024) https://doi.org/10.1117/12.3016932
Event: SPIE Photonics Europe, 2024, Strasbourg, France

Abstract

Multi-photon polymerization is widely recognised as a promising approach for the fabrication of fully 3D micro or nano-metric structures. The ability to write such structures at high plot rates would open new frontiers in many fields such as health, optical micro-devices, security holograms etc. Parallelization of the fabrication process increases fabrication speed. In a first parallelization approach we use a short pulsed laser (picoseconds or femtoseconds) with a diffractive optical element which allows simultaneous fabrication with hundreds write spots, decreasing the overall fabrication time. In a second approach, a 1920 x 1080 pixel spatial light modulator is imaged into an ultra-sensitive resist using continuous wave laser. However, massive parallelization can lead to unwanted fabrication artefacts. Light field overlapping in out-of-focus planes and proximity effects are currently major issues limiting the performance of parallel micro fabrication processes due to the undesired polymerisation that results. We will present our latest photo-chemical process digital simulation results and show how they are enabling us to develop and apply precompensation techniques to the plot data to fabricate structures with a smaller Z-extent and/or circumvent proximity effects.

Conference Presentation

Citation Download Citation

F. Ogor, T. Le Deun, V. Sedova, J. Rovera, A. Erdmann, M. Flury, and K. Heggarty "Modelling and compensating proximity effects in massively parallelized multiphoton photoplotter", Proc. SPIE 12995, 3D Printed Optics and Additive Photonic Manufacturing IV, 1299509 (18 June 2024); https://doi.org/10.1117/12.3016932

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available