1The Univ. of Texas at Dallas (United States) 2State Univ. of New York at Stony Brook (United States) 3Brookhaven National Lab. (United States) 4Inha Univ. (Korea, Republic of)
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In this study, we focus on examining the stability of Al-based inorganic-organic hybrid thin films deposited through the molecular atomic layer deposition (MALD) process in ambient environment. Our observations reveal an initial reduction in material thickness within the first 3 days, followed by a period of stability. XPS analysis is employed to further investigate the chemical alternations in the aged Al-based hybrid thin films, revealing an increase in C=O species as well as overall oxygen content in the material. We also evaluate the effects of atmospheric exposure on the sensitivity of the Al-based hybrid thin films using electron flood exposure. This study aims to enhance the understanding of the stability of a vapor-phase synthesized hybrid thin film system for advanced resist applications.
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(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
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Dan N. Le, Thi Thu Huong Chu, Jin-Hyun Kim, Jean-Francois Veyan, Won-Il Lee, Nikhil Tiwale, Minjong Lee, Seungsoo Choi, Jihoon Woo, Chang-Yong Nam, Rino Choi, Jiyoung Kim, "Understanding the stability of advanced inorganic-organic hybrid thin films for advanced resist applications," Proc. SPIE 12957, Advances in Patterning Materials and Processes XLI, 129570B (9 April 2024); https://doi.org/10.1117/12.3010970