A study on EUV patterning with colloidal nanoparticles

Saurav Mohanty; Ethan Flores; Chih-Hao Chang

doi:10.1117/12.2687727

21 November 2023 A study on EUV patterning with colloidal nanoparticles

Saurav Mohanty, Ethan Flores, Chih-Hao Chang

Proceedings Volume 12750, International Conference on Extreme Ultraviolet Lithography 2023; 1275011 (2023) https://doi.org/10.1117/12.2687727
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Conference Poster

Abstract

Extreme ultraviolet (EUV) lithography has pushed the limits of optical lithography techniques, enabling patterning of highresolution feature sizes and driving innovation in the semiconductor industry. Traditional top-down lithography processes face challenges with EUV interference lithography, such as requiring precise incidence angles and specialized, expensive multilayer mirrors for nanostructure patterning. Colloidal nanosphere lithography offers an effective and inexpensive nearfield technique, utilizing self-assembled nanoparticles to create complex 2D and 3D nanostructures. However, existing work primarily uses UV lasers, limiting pattern resolution to above 100 nm. In this study, we propose using colloidal nanosphere lithography combined with a 30 nm wavelength EUV light source to pattern periodic geometric patterns. We describe the proposed system, which consists of a high harmonic generation source pumped by an ultrafast laser at wavelength of 30 nm. The beam shapes and characteristics are characterized and presented. Initial results demonstrate successful patterning using the colloidal assembly serves as a mask, achieving complex geometric patterns with sub-50 nm feature sizes. This work explores a low-cost and scalable approach to studying EUV light interaction through colloidal nanosphere assemblies for 3D nanostructure patterning.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Saurav Mohanty, Ethan Flores, and Chih-Hao Chang "A study on EUV patterning with colloidal nanoparticles", Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 1275011 (21 November 2023); https://doi.org/10.1117/12.2687727

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