Molybdenum carbide pellicle for high-power EUV lithography

Yongkyung Kim; Kihun Seong; Jonghyuk Yoon; Donggi Lee; Seungchan Moon; Sung Kyu Jang; Hyun-Mi Kim; Seul-Gi Kim; Jinho Ahn; Hyeongkeun Kim

doi:10.1117/12.2686314

21 November 2023 Molybdenum carbide pellicle for high-power EUV lithography

Yongkyung Kim, Kihun Seong, Jonghyuk Yoon, Donggi Lee, Seungchan Moon, Sung Kyu Jang, Hyun-Mi Kim, Seul-Gi Kim, Jinho Ahn, Hyeongkeun Kim

Author Affiliations +

Proceedings Volume 12750, International Conference on Extreme Ultraviolet Lithography 2023; 127500L (2023) https://doi.org/10.1117/12.2686314
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

As the power of EUVL (extreme ultraviolet lithography) scanners increases, the thermal load and hydrogen plasma environment applied to the pellicle become harsher. If the core material of the pellicle membrane is unstable in the EUV environment, reliability depends on the top-most layer (capping). However, the loss of EUV transmission restricts the thickness of the capping and raises concerns related to hydrogen radicals or protons. In our previous report, we introduced molybdenum carbide (Mo₂C) as a new pellicle material with high EUV transmittance (91.4 %), transmission uniformity (3σ=0.49 %, 5×5 mm²), and chemical stability against a hydrogen plasma. In this report, we demonstrate the stability against high-intensity (30 W/cm²) EUV irradiation and hydrogen plasma for Mo₂C membranes. Large-area (≥5×5 cm²) Mo₂C membranes with high EUV transmittance (≥88 %) were fabricated using MEMS technology. The membranes were tested for thermal load test using an 808 nm infrared laser under the same conditions producing up to 3000 wafers in the EUV scanner. The chemical properties of the membranes were evaluated using an inductively coupled plasma device in a high-temperature (<900 °C) hydrogen gas and plasma environment. Furthermore, the EUV transmittance for the Mo₂C membrane and the difference after thermal load and hydrogen plasma evaluation were characterized by EUV coherence scattering microscopy. Consequently, we show the feasibility of high-volume manufacturing (HVM) Mo2C pellicles by fabricating the membrane over 5 × 5 cm₂.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Yongkyung Kim, Kihun Seong, Jonghyuk Yoon, Donggi Lee, Seungchan Moon, Sung Kyu Jang, Hyun-Mi Kim, Seul-Gi Kim, Jinho Ahn, and Hyeongkeun Kim "Molybdenum carbide pellicle for high-power EUV lithography", Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 127500L (21 November 2023); https://doi.org/10.1117/12.2686314

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