Presentation + Paper
5 October 2023 Extrinsic and intrinsic p-type doping of pulsed laser deposited few-layer WS2 films
Author Affiliations +
Abstract
X-ray photoelectron spectroscopy confirmed (XPS) that Nb substitutes on W lattice sites yielding substitutional extrinsic p-type doping in pulsed laser deposited (PLD) few-layer WS2:Nb films. A Fermi level separation of 0.31 eV from the valence band edge with 0.5 atomic % of Nb doping was measured by ultraviolet photoelectron spectroscopy (UPS), which decreased to 0.18 eV when doping was increased to 1.1 atomic %. The corresponding hole sheet concentrations increased from 3.9 x 1012 to 8.6 x 1013 cm-2 respectively while the mobility exhibited the opposite trend, presumably due to increased ionized impurity scattering. Separately, undoped PLD few-layer WS2 films exhibited a conductivity switch from n to p-type when the composition changed from sulfur-deficient to sulfur-rich. UPS revealed a workfunction increase from 3.36 to 4.52 eV and a corresponding change in the Fermi level separation from the valence band edge. The intrinsic p-type conductivity is assigned to excess sulfur in the form of interstitials. Despite the relatively large change in workfunction in these films, Ohmic contacts were obtained to both the n and p-type materials with indium, albeit with different contact resistances. This suggests that in addition to the interfacial energy barrier, tunneling from gap states associated with point defects and surface contamination are likely contributors to charge injection. The approach demonstrates the potential of PLD for controlled doping and the creation of p-n junctions from transition metal dichalcogenides.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nigel Shepherd, Urmila Rathod, and Andrey Voevodin "Extrinsic and intrinsic p-type doping of pulsed laser deposited few-layer WS2 films", Proc. SPIE 12651, Low-Dimensional Materials and Devices 2023, 1265102 (5 October 2023); https://doi.org/10.1117/12.2677448
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KEYWORDS
Doping

Niobium

Sulfur

Electrical conductivity

Annealing

Scattering

X-ray photoelectron spectroscopy

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