Non-isoplanatic lens aberration corrections in digital holographic microscopy

Tamar Cromwijk; Manashee Adhikary; Sander Konijnenberg; Wim Coene; Teus Tukker; Johannes de Boer; Stefan Witte; Arie den Boef

doi:10.1117/12.2673637

15 August 2023 Non-isoplanatic lens aberration corrections in digital holographic microscopy

Tamar Cromwijk, Manashee Adhikary, Sander Konijnenberg, Wim Coene, Teus Tukker, Johannes de Boer, Stefan Witte, Arie den Boef

Author Affiliations +

Proceedings Volume 12618, Optical Measurement Systems for Industrial Inspection XIII; 126180Y (2023) https://doi.org/10.1117/12.2673637
Event: SPIE Optical Metrology, 2023, Munich, Germany

Abstract

The demand for accurate and sub-nanometer precise overlay measurements in semiconductor industry increases with the shrinking feature sizes in integrated circuits. Overlay, the lateral displacement between two layers allows monitoring the chip fabrication process and is part of an import feedback step. In our approach, a digital holographic microscope measures the complex field of the overlay target using simple optics and an additional reference beam. The measured complex valued field allows us to apply computational algorithms to correct for field-position dependent lens aberrations in a computational efficient manner. We present experimental results that show the capability of our computational aberration correction in the visible and near infrared wavelength regimes.

Conference Presentation

Citation Download Citation

Tamar Cromwijk, Manashee Adhikary, Sander Konijnenberg, Wim Coene, Teus Tukker, Johannes de Boer, Stefan Witte, and Arie den Boef "Non-isoplanatic lens aberration corrections in digital holographic microscopy", Proc. SPIE 12618, Optical Measurement Systems for Industrial Inspection XIII, 126180Y (15 August 2023); https://doi.org/10.1117/12.2673637

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