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We present a high performance nanohole metasurface lens design operating at 1550nm. We use a simple basis with features that can be made using DUV lithography so that the lens could be manufactured scalably and economically. Our basis consists of cylindrical nanoholes etched into a silicon wafer where the hole radius is the only degree of freedom. We design an anti-reflection (AR) coating for the exposed meta-atom surface to enable high transmission across the basis; we evaluated three candidate materials and selected ZnS because it yielded the best optical performance. Lens layout was performed using a parametric meta-atom library generated with finite-element analysis in CST studio under the local uniformity approximation. We modelled performance of the lens, including both transmission and diffraction losses, using a parametric blazed-grating library to represent small sections of the aperture and then sum across the aperture. We compare the lens performance against a bulk singlet.
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