Potential of biomass EUV non-CAR type resist for high-NA EUV lithography

Kazuyo Morita; Yasuaki Tanaka; Yuji Tanaka; Masaya Asai

doi:10.1117/12.2657938

30 April 2023 Potential of biomass EUV non-CAR type resist for high-NA EUV lithography

Kazuyo Morita, Yasuaki Tanaka, Yuji Tanaka, Masaya Asai

Proceedings Volume 12498, Advances in Patterning Materials and Processes XL; 1249815 (2023) https://doi.org/10.1117/12.2657938
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

A biomass EUV non-CAR type resist is proposed as a sustainable material for reducing CO₂ emissions. It was demonstrated that HP 8 nm L/S pattern formation is required for a 1.5 nm node device with a biomass EUV resist. Furthermore, two approaches for improving the EUV lithography performance of biomass EUV resists are proposed: resist structure and lithography process improvement. The pattern quality was improved upon improving the resist structure. In addition, the lithography process [pre-exposure metal infiltration (PreMi) process and the new lithography process] improved the sensitivity of the biomass EUV resist. This proves that the biomass EUV resist can be used in high-NA EUV lithography at 8 nm.

Conference Presentation

Citation Download Citation

Kazuyo Morita, Yasuaki Tanaka, Yuji Tanaka, and Masaya Asai "Potential of biomass EUV non-CAR type resist for high-NA EUV lithography", Proc. SPIE 12498, Advances in Patterning Materials and Processes XL, 1249815 (30 April 2023); https://doi.org/10.1117/12.2657938

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