Design for manufacturability (DFM) in-design fixing for improving manufacturability aware scoring (MAS)

Ariel De Jesus Reyes Ruiz; Lynn T. N. Wang; Fadi Batarseh; Uwe Paul Schroeder

doi:10.1117/12.2659397

28 April 2023 Design for manufacturability (DFM) in-design fixing for improving manufacturability aware scoring (MAS)

Ariel De Jesus Reyes Ruiz, Lynn T. N. Wang, Fadi Batarseh, Uwe Paul Schroeder

Proceedings Volume 12495, DTCO and Computational Patterning II; 124950V (2023) https://doi.org/10.1117/12.2659397
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

Design for Manufacturability (DFM) in-design fixing methodologies are developed to improve Manufacturability Aware Scoring (MAS). Two methodologies have been evaluated. For the first methodology, DFM recommended rules are inserted in the reference flow for rip-up-and-reroute, thus fixing DFM rule violations, improving the MAS score. For the second methodology, pattern classification is used to classify the recommended rules into patterns based on the profiling of multiple layout designs. A library of fixable patterns with corresponding fixes is built. The pattern library is then inserted in the rip-up-and-reroute flow to fix the DFM rule violations, improving the MAS score. The methodologies are demonstrated on 28nm technology. Results show an average fix rate of 89.1 % for a design with a core utilization of 0.6 and 78.4% with a core utilization of 0.6 for three DFM MAS enclosure rules, VIA2, VIA3 and VIA4 layers.

Conference Presentation

Citation Download Citation

Ariel De Jesus Reyes Ruiz, Lynn T. N. Wang, Fadi Batarseh, and Uwe Paul Schroeder "Design for manufacturability (DFM) in-design fixing for improving manufacturability aware scoring (MAS)", Proc. SPIE 12495, DTCO and Computational Patterning II, 124950V (28 April 2023); https://doi.org/10.1117/12.2659397

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