Growth of Ge1-xSnx Alloys for MWIR sensing applications

Bruce Claflin; Gordon Grzybowski; Joshua Duran

doi:10.1117/12.2647373

31 January 2023 Growth of Ge_1-xSn_x alloys for MWIR sensing applications

Bruce Claflin, Gordon Grzybowski, Joshua Duran

Proceedings Volume 12477, International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors 2022; 124770M (2023) https://doi.org/10.1117/12.2647373
Event: International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors, 2022, Boston, Massachusetts, United States

Abstract

Films of Ge_1-xSn_x have been grown on Ge, Si, and Al₂O₃ substrates by remote plasmaenhanced chemical vapor deposition with Sn concentrations greater than 10% and thicknesses greater than 1 μm. Characterization data of the structural, optical, and electrical properties of these alloys are presented. Device characteristics from planar photoconductor and vertical p-n devices grown directly on Si substrates show promise for future MWIR sensing applications.

Citation Download Citation

Bruce Claflin, Gordon Grzybowski, and Joshua Duran "Growth of Ge_1-xSn_x alloys for MWIR sensing applications", Proc. SPIE 12477, International Workshop on Thin Films for Electronics, Electro-Optics, Energy and Sensors 2022, 124770M (31 January 2023); https://doi.org/10.1117/12.2647373

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available