High quality optical Indium Tin Oxide (ITO) layers deposited by ion beam sputtering (IBS)

Konstantina Kostourou; Volker Scheuer; Daniel Kopf

doi:10.1117/12.2648888

16 March 2023 High quality optical Indium Tin Oxide (ITO) layers deposited by ion beam sputtering (IBS)

Konstantina Kostourou, Volker Scheuer, Daniel Kopf

Proceedings Volume 12422, Oxide-based Materials and Devices XIV; 124220K (2023) https://doi.org/10.1117/12.2648888
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

This is a study of the potential of IBS for the production of high-quality ITO layers for optical applications with additional electrical requirements. The electrical properties of ITO layers combined with underlying optical interference layers and their optical properties and surface roughness are presented.

Conference Presentation

Citation Download Citation

Konstantina Kostourou, Volker Scheuer, and Daniel Kopf "High quality optical Indium Tin Oxide (ITO) layers deposited by ion beam sputtering (IBS)", Proc. SPIE 12422, Oxide-based Materials and Devices XIV, 124220K (16 March 2023); https://doi.org/10.1117/12.2648888

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