Multibeam mask requirements for advanced EUV patterning

M. Chandramouli; B. Liu; Z. Alberti; F. Abboud; G. Hochleitner; W. Wroczewski; S. Kuhn; C. Klein; E. Platzgummer

doi:10.1117/12.2645895

1 December 2022 Multibeam mask requirements for advanced EUV patterning

M. Chandramouli, B. Liu, Z. Alberti, F. Abboud, G. Hochleitner, W. Wroczewski, S. Kuhn, C. Klein, E. Platzgummer

Proceedings Volume 12293, Photomask Technology 2022; 122930O (2022) https://doi.org/10.1117/12.2645895
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Multibeam mask writers (MBMW) from IMS Nanofabrication developed in the last decade are currently being used for leading edge mask patterning. The ability to utilize low sensitivity resists required to pattern complex mask patterns with good edge placement control made MBMW the tool of choice for leading edge extreme ultraviolet (EUV) mask patterning. The next generation of High-NA EUV masks will require smaller features, more complex figures and reduction of edge placement errors. These requirements may exceed the capability of the current MBMW tools. Recently IMS announced the next generation MBMW tools to address this challenge. This paper will explore the effectiveness of the proposed improvements on addressing High-NA EUV mask patterning challenges.

Conference Presentation

Citation Download Citation

M. Chandramouli, B. Liu, Z. Alberti, F. Abboud, G. Hochleitner, W. Wroczewski, S. Kuhn, C. Klein, and E. Platzgummer "Multibeam mask requirements for advanced EUV patterning", Proc. SPIE 12293, Photomask Technology 2022, 122930O (1 December 2022); https://doi.org/10.1117/12.2645895

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