Presentation + Paper
1 December 2022 You don’t need 1nm contours for curvilinear shapes: pixel-based computing is the answer
Author Affiliations +
Abstract
Enabled by multi-beam mask writing [1], curvilinear free-form ILT [2], and GPU acceleration [3], curvilinear masks are quickly becoming the norm in leading edge masks, whether for 193i or for EUV, particularly for contact and via layers. An industry standard for compactly representing curvilinear shapes is being developed for SEMI through an industry working group. In it, Bezier, and B-spline "Multigon" formats are proposed to augment the piecewise linear polygons that are supported today [4]. Whether these infinite-resolution curvilinear formats are used or piecewise linear polygons are used, there is a question of what constitutes a high enough vertex density to be of some pre-defined accuracy requirement. With these infinite-resolution curvilinear formats, the vertex density would be lower than with piecewise linear polygons for a particular accuracy requirement. But it is still useful to know what density is theoretically sufficient. This paper explores the concept of rasterization and the mathematical dual between contours and pixel dose arrays given a particular known resolution limit. The paper further argues that curvilinear ILT, practically speaking, is all computed in the pixel domain. And all curvilinear masks, with the notable exception of MWCO masks for 193i [5], are written with multi-beam machines using pixel dose arrays. The paper further argues that all images taken of the resulting masks, whether for inspection, disposition, or for metrology are pictures taken as pixel dose arrays of some resolution with some image processing afterwards. Information theory is a branch of computer science that, among other things, gives insight on how much data is sufficient to represent any particular information content [6,7,8]. More generally, the field covers the idea of digitizing the analog world to some known limit of resolution. Rasterization is digitalization of images that converts from contours, be it piecewise linear polygons, or some infinite resolution curves, to pixel doses of some pixel size and dose range. Contouring is the converse, going from pixel doses to geometric space. By understanding information theory, how curvilinear mask shapes are computed, and how curvilinear mask shapes are generated on
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Abhishek Shendre, Aki Fujimura, Mariusz Niewczas, and Tom Kronmiller "You don’t need 1nm contours for curvilinear shapes: pixel-based computing is the answer", Proc. SPIE 12293, Photomask Technology 2022, 1229307 (1 December 2022); https://doi.org/10.1117/12.2643339
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks

Semiconducting wafers

Manufacturing

Extreme ultraviolet

Information theory

Image resolution

Optical proximity correction

RELATED CONTENT

Mask technology for 0.18-um device generation
Proceedings of SPIE (July 24 1996)
Cost-effective strategies for ASIC masks
Proceedings of SPIE (July 02 2003)
Multichip reticle approach for OPC model verification
Proceedings of SPIE (December 17 2003)
EUV mask blank defect avoidance solutions assessment
Proceedings of SPIE (November 08 2012)
SMO photomask inspection in the lithographic plane
Proceedings of SPIE (September 23 2009)

Back to Top