Poster + Paper
26 May 2022 An in-depth look at comprehensive and efficient methodology for CD uniformity budget breakdown
Author Affiliations +
Conference Poster
Abstract
Understanding contributors to critical dimension uniformity (CDU) is becoming ever more important. We propose a systematic CDU breakdown into contributions that can be attributed to local CDU, intra-field CDU, field-to-field CDU, intra-lot CDU and lot-to-lot CD variations using smart metric definitions. We checked the CDU breakdown on synthetic data as well as on real DRAM production data. Comparing our CDU breakdown to results from nested ANOVA made with statistical software packages, we could verify that the results were very close, while our calculation method was orders of magnitude faster.
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ulrich Denker, Philip Gröger, Xaver Thrun, Stefan Buhl, Mycahya Eggleston, Nhi Doan, Gou Kawaguchi, and Ranjan Khurana "An in-depth look at comprehensive and efficient methodology for CD uniformity budget breakdown", Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 120531V (26 May 2022); https://doi.org/10.1117/12.2613709
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KEYWORDS
Critical dimension metrology

Statistical analysis

Data corrections

Error analysis

Lithography

Scanners

Standards development

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