Advanced CD uniformity correction using radial basis function (RBF) models

Philip Groeger; Ulrich Denker; Robin Zech; Stefan Buhl; Matthias Ruhm; Mingyu Kim; Hongseok Jang; Chunsoo Kang; Dongyoung Lee; Hyunjun Kim; Sukwon Park; Bohye Kim; Honggoo Lee; Sangho Lee; Dongsub Choi; Jeonghoon Lee

doi:10.1117/12.2607571

26 May 2022 Advanced CD uniformity correction using radial basis function (RBF) models

Philip Groeger, Ulrich Denker, Robin Zech, Stefan Buhl, Matthias Ruhm, Mingyu Kim, Hongseok Jang, Chunsoo Kang, Dongyoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee, Dongsub Choi, Jeonghoon Lee

Author Affiliations +

Proceedings Volume 12053, Metrology, Inspection, and Process Control XXXVI; 1205314 (2022) https://doi.org/10.1117/12.2607571
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Conference Poster

Abstract

Critical dimension uniformity (CDU) control using dose correction is well established and has relied on traditional polynomial models like Zernike and Legendre for a long time. As process margins are shrinking and CD (and CDU) control becomes a significant contributor to edge placement error (EPE), the dose correction models need to be enhanced to represent the systematic behavior of the fingerprints more precisely. In this paper we show that many CD signatures over the exposure field or over the wafer cannot be corrected efficiently using classical polynomials. As the CD signatures can come from a variety of processes like etch, CVD, polish, or deposition, a flexible model approach is required. Furthermore, making the right decision when choosing the correct model order of the classical polynomial based model is complicated as we need to handle the balance between the degrees of freedom and minimizing the residuals. With this problem statement in mind, we introduce a novel radial basis function (RBF) modeling approach for dose corrections that can correct a wide range of signatures. The new modeling approach is verified on real CD signatures on product, reducing CDU significantly. Additionally, we demonstrate that this approach can make the life of the engineers easy again, as there are no prior decisions about model type and order needed.

Conference Presentation

Citation Download Citation

Philip Groeger, Ulrich Denker, Robin Zech, Stefan Buhl, Matthias Ruhm, Mingyu Kim, Hongseok Jang, Chunsoo Kang, Dongyoung Lee, Hyunjun Kim, Sukwon Park, Bohye Kim, Honggoo Lee, Sangho Lee, Dongsub Choi, and Jeonghoon Lee "Advanced CD uniformity correction using radial basis function (RBF) models", Proc. SPIE 12053, Metrology, Inspection, and Process Control XXXVI, 1205314 (26 May 2022); https://doi.org/10.1117/12.2607571

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available