Presentation + Paper
4 March 2022 Three-dimensional fs-laser subtractive nanolithography of crystals
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Abstract
Nanoscale structuring of hard, brittle, and high-quality cm-scale optical crystals has remained a two-dimensional surface process until the recent report that 3D architectures can be sculpted inside laser crystals (YAG and sapphire) with feature sizes on the 100 nm level and nanoscale precision. The mechanism by which these phenomena can occur is a giant wetchemical etching selectivity of around a million (~106 ) between photomodified and unmodified crystal volumes, which enables nanopores (~200 nm) to reach mm-scale lengths, discovered and recently reported by A. Ródenas et al. [1]. We report here recent results that expand the state-of-the-art on this new 3D nanolithographic technique for undoped YAG
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Ródenas, F. Paz-Buclatin, A. Casasnovas Melián, O. De Varona, L. L. Martin, and I. R. Martin "Three-dimensional fs-laser subtractive nanolithography of crystals", Proc. SPIE 11989, Laser-based Micro- and Nanoprocessing XVI, 1198902 (4 March 2022); https://doi.org/10.1117/12.2608613
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KEYWORDS
Etching

Crystals

Nanolithography

Laser crystals

YAG lasers

Crystal optics

Lanthanum

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