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22 February 2021 The journey of new materials and processes for directed self-assembly
Chris Ellison
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Proceedings Volume 11610, Novel Patterning Technologies 2021; 116100P (2021) https://doi.org/10.1117/12.2584938
Event: SPIE Advanced Lithography, 2021, Online Only
Abstract
Block copolymer self-assembly is showing great promise for extending the resolution limits of established, high-throughput photolithography techniques. This technology has the potential to broadly enhance device capabilities ranging from magnetic data storage media to photovoltaic cells to semiconductors. This talk will highlight the journey towards the development of new materials, including synthesis and characterization, and new processing protocols for controlling their thin film structures. Finally, perspectives for their future implementation into commercial lithographic patterning processes will be given.
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Chris Ellison "The journey of new materials and processes for directed self-assembly", Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100P (22 February 2021); https://doi.org/10.1117/12.2584938
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KEYWORDS
Directed self assembly
Materials processing
Optical lithography
Data storage
Lithography
Magnetic semiconductors
Magnetism
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