Presentation + Paper
23 March 2021 CNT EUV pellicle tunability and performance in a scanner-like environment
Author Affiliations +
Abstract
Research on carbon nanotube (CNT) films for the EUV pellicle application was initiated at imec in 2015 triggered by the remarkable optical, mechanical, and thermal properties of the CNT material. Today the advancement of the CNT material synthesis together with matured methods to fabricate thin CNT membranes make free-standing CNT films a very promising EUV pellicle candidate for high volume EUV lithography. Balancing the CNT material properties for the optimal pellicle performance in EUV scanners remains the ongoing research focus. Depending on the density and morphology of the CNTs within the film and individual CNT parameters, like number of walls, bundle size, metal catalyst content, purity etc., the optical and thermal properties of the CNT pellicle can be tuned. It is critical for the pellicle to be stable in the EUV lithography scanner environment which includes hydrogen plasma and heat loads associated with high powers beyond 250 W. Different types of CNTs, i.e. single-, double-, multi-walled CNTs and their combinations, are explored as building blocks of an optimized pellicle membrane. Optical properties of different pellicles and their ability to withstand high EUV powers in the hydrogen-based environment were tested. Transmission, spectroscopic and chemical composition mapping of the exposed free-standing CNT films are used to study the material changes that occur in the scanner-like environment. A solution is needed to extend the CNT pellicle lifetime and coating is discussed as a potential approach to protect the CNT material from hydrogen plasma damage.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marina Y. Timmermans, Ivan Pollentier, Maxim Korytov, Thomas Nuytten, Stefanie Sergeant, Thierry Conard, Johan Meersschaut, Yide Zhang, Masoud Dialameh, Wilfried Alaerts, Ehsan Jazaeri, Valentina Spampinato, Alexis Franquet, Steven Brems, Cedric Huyghebaert, and Emily E. Gallagher "CNT EUV pellicle tunability and performance in a scanner-like environment", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 116090Y (23 March 2021); https://doi.org/10.1117/12.2584519
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KEYWORDS
Pellicles

Extreme ultraviolet

Extreme ultraviolet lithography

Carbon nanotubes

Plasma

Scanners

Hydrogen

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