Nano optical measurement for next-generation nano/micro manufacturing based on localized light energy control

Satoru Takahashi

doi:10.1117/12.2574755

15 June 2020 Nano optical measurement for next-generation nano/micro manufacturing based on localized light energy control

Satoru Takahashi

Author Affiliations +

Proceedings Volume 11523, Optical Technology and Measurement for Industrial Applications 2020; 115230G (2020) https://doi.org/10.1117/12.2574755
Event: SPIE Technologies and Applications of Structured Light, 2020, Yokohama, Japan

Abstract

In the nano/micro manufacturing, in-process optical inspection plays one of the most important roles for producing the advanced products with high reliability, because it has several practical advantages typified by nondestructiveness, high-throughput characteristics, and so on. Optical measurement methods, however, essentially restrict its spatial resolution due to the diffraction limit, which means that finer structures less than half of the wavelength of optical wave from the objects to be inspected, cannot be observed. This resolution limit of the optical measurement method is a critical problem especially for the nano/micro manufacturing process, where the features of submicrometer fine structures should generate special functions. This critical limit about spatial resolution can be physically explained by focusing on light energy localization property. As shown in Table1, light energy can be mainly classified into the following three types of localizations: (1) Evanescent light generated under the total internal reflection. (2) Near-field light existing in the vicinity of tips of the near-field optical probe. (3) Interference intensity distribution of standing wave (mainly generated with two beam interference) and focusing beam (generated with multiple-beam interference), both of which consist of free-space propagating light (freely propagating light) waves. Physical principles for spatial resolution improvement are essentially different based on these types of light energy localization. In order to develop the effective optical inspection beyond the diffraction limit, it is important to recognize their super resolution property depending on their light localization. Evanescent light is known as effective near-field light illumination for surface, which can be applied to near-field scanning optical microscopic inspections.

Citation Download Citation

Satoru Takahashi "Nano optical measurement for next-generation nano/micro manufacturing based on localized light energy control", Proc. SPIE 11523, Optical Technology and Measurement for Industrial Applications 2020, 115230G (15 June 2020); https://doi.org/10.1117/12.2574755

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
2 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Optics manufacturing

Near field optics

Near field scanning optical microscopy

Optical testing

Fusion energy

Remote sensing

Diffraction

Show All Keywords

Keywords/Phrases

Search In:

Publication Years