Paper
21 August 2020 Refractive optics based x-ray reflecto-interferometry
Author Affiliations +
Abstract
A new X-ray Reflecto-Interferometry (XRI) technique is proposed and realized for thin-film characterization. The XRI employs refractive optics that produce a converging fan of radiation, incident onto a sample surface, and a high-resolution CCD detector, which simultaneously collects the reflecto-interferogram over a wide angular range. The functional capabilities of the new method were experimentally tested at the ESRF ID06, and ID10 beamlines in the X-ray energy range from 14 keV to 22 keV. The free-standing Si3N4 membranes with different thickness were studied. The main advantages and possible future applications of the proposed reflecto-interferometry are discussed.
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Lyatun, I. Lyatun, D. Zverev, O. Konovalov, I. Snigireva, and A. Snigirev "Refractive optics based x-ray reflecto-interferometry", Proc. SPIE 11491, Advances in X-Ray/EUV Optics and Components XV, 114910N (21 August 2020); https://doi.org/10.1117/12.2567988
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
X-rays

X-ray optics

Reflectivity

Silicon

Sensors

Thin films

Lenses

Back to Top