Low Temperature Diamond Deposition On Glass

Y. Liou; A. Inspektor; D. Knight; R. Weimer; D. Pickrell; A. R. Badzian; R. Messier

doi:10.1117/12.962057

15 January 1989 Low Temperature Diamond Deposition On Glass

Y. Liou, A. Inspektor, D. Knight, R. Weimer, D. Pickrell, A. R. Badzian, R. Messier

Proceedings Volume 1146, Diamond Optics II; (1989) https://doi.org/10.1117/12.962057
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

Diamond films by chemical vapor deposition have good potential for optical application only if transparent films can be produced. Thin diamond films were deposited on silicon, lead glass, MgO, fused silica and soda-lime silica at low temperatures (<500°C) by microwave plasma enhanced chemical vapor deposition. Low temperatures were achieved either by lowering microwave powers and pressures or by remoting the plasma. The deposited films were either white and transluscent or highly transparent depending on the different gas mixtures being used. The effect of gas composition on diamond formation will be discussed. Raman peak shifts of 2 to 8 cm^-1 were observed due to the strain in the film. The exact temperature of the growth surface is uncertain as measurements were made only of the substrate bulk. Estimated temperatures were reported by careful calibration.

Citation Download Citation

Y. Liou, A. Inspektor, D. Knight, R. Weimer, D. Pickrell, A. R. Badzian, and R. Messier "Low Temperature Diamond Deposition On Glass", Proc. SPIE 1146, Diamond Optics II, (15 January 1989); https://doi.org/10.1117/12.962057

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