Paper
26 April 2019 Fabrication of a two-dimensional graded periodic Mo/Si multilayer mirror using magnetron sputtering technology
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Abstract
Aperiodic multilayer structure and lateral gradual multilayer structure can be used to expand spectral bandwidth of multilayer polarizers. To extend application of polarization in EUV and X-ray region, two-dimensional graded multilayer structure is utilized, which is a kind of mirror with gradient period along two lateral directions and can be widely used in synchrotron radiation and polarization studies of magnetic materials. In this paper, a [Mo/Si]25 laterally graded multilayer was deposited on a 40 mm×40 mm large silicon substrate by magnetron sputtering and it was measured by grazing incidence X-ray reflection. The d-spacing gradient along X direction, from 0.0528 nm/mm to 0.116 nm/mm, was achieved by controlling the velocity of the substrate as it passes through the flux. A shaped mask controlled the d-spacing gradient in the Y-axis perpendicular to substrate translation, from 0.12 nm/mm to 0.18 nm/mm. The dspacing was 6.39 nm for the minimum and 15.65 nm for the maximum. This method is capable to prepare twodimensional laterally graded multilayer mirror in EUV and X-ray regions.
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Jinwen Chen, Bin Ji, Jiayi Zhang, Shengming Zhu, Miao Li, Mingqi Cui, Jingtao Zhu, and Jie Zhu "Fabrication of a two-dimensional graded periodic Mo/Si multilayer mirror using magnetron sputtering technology", Proc. SPIE 11032, EUV and X-ray Optics: Synergy between Laboratory and Space VI, 110320R (26 April 2019); https://doi.org/10.1117/12.2520849
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KEYWORDS
Sputter deposition

Molybdenum

X-rays

Multilayers

Reflectivity

Extreme ultraviolet

Polarization

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