Induced bistability into quartz glass by silicon wafer heat treatment  in lamp-based reactor

Valeriya P. Prigara; Vladimir V. Ovcharov

doi:10.1117/12.2521891

15 March 2019 Induced bistability into quartz glass by silicon wafer heat treatment in lamp-based reactor

Valeriya P. Prigara, Vladimir V. Ovcharov

Proceedings Volume 11022, International Conference on Micro- and Nano-Electronics 2018; 110221U (2019) https://doi.org/10.1117/12.2521891
Event: The International Conference on Micro- and Nano-Electronics 2018, 2018, Zvenigorod, Russian Federation

Abstract

Formulas were derived for the calculation of thermal radiation heat transfer in a radiative-closed thermal system containing two semitransparent gray wafers placed between two opaque wafers. The formulas have universal application and can be used in calculation of a thermal system both with true radiation and with combined mechanisms of heat transfer. On the basis of the obtained relations, thermal transfer has been simulated in a lamp-based reactor including quartz glass that serves for protection of the working chamber against air flow cooling a heating block of the reactor. An induced bistability effect into the quartz glass wafer is confirmed [1] in calculations by the use of real optical properties of heater and absorber materials.

Citation Download Citation

Valeriya P. Prigara and Vladimir V. Ovcharov "Induced bistability into quartz glass by silicon wafer heat treatment in lamp-based reactor", Proc. SPIE 11022, International Conference on Micro- and Nano-Electronics 2018, 110221U (15 March 2019); https://doi.org/10.1117/12.2521891

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