Imaging behavior of highly fluorinated molecular resists under extreme UV radiation

Hyuntaek Oh; Seok-Heon Jung; Jeong-Seok Mun; Kanghyun Kim; Sangsul Lee; Jin-Kyun Lee

doi:10.1117/12.2514928

25 March 2019 Imaging behavior of highly fluorinated molecular resists under extreme UV radiation

Hyuntaek Oh, Seok-Heon Jung, Jeong-Seok Mun, Kanghyun Kim, Sangsul Lee, Jin-Kyun Lee

Proceedings Volume 10960, Advances in Patterning Materials and Processes XXXVI; 1096012 (2019) https://doi.org/10.1117/12.2514928
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

We propose a concept of organic small molecule-based EUV resists that do not require sub-stoichiometric ingredients. Based on our previous results with highly fluorinated electron-beam (e-beam) resists, we designed amorphous small molecules equipped with perfluoroalkyl ether (PFAE) chains. The synthesis of the prototype was carried out successfully, and its physical properties, imaging mechanism, and performance were all evaluated under e-beam exposure conditions. Although the prototype showed slightly low sensitivity to EUV irradiation, we were able to mitigate the issue by appending other cross-linkable functional moieties. The modified version showed decent negative-tone patterning performance under e-beam exposure and could form images under EUV irradiation and the pattern development step using highly fluorinated solvents.

Conference Presentation

Citation Download Citation

Hyuntaek Oh, Seok-Heon Jung, Jeong-Seok Mun, Kanghyun Kim, Sangsul Lee, and Jin-Kyun Lee "Imaging behavior of highly fluorinated molecular resists under extreme UV radiation", Proc. SPIE 10960, Advances in Patterning Materials and Processes XXXVI, 1096012 (25 March 2019); https://doi.org/10.1117/12.2514928

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