Due to the strong demand for photonic computing, on-chip optical communication, medical imaging, and biosensing at the nanoscale, interest in nanolasers has grown dramatically in recent years. Plasmonic lasers are promising as nanoscale laser sources and have been widely studied using semiconductor nanowires on metal surfaces grown by bottom-up techniques. However, these nanowire plasmonic lasers require transfer and positioning after fabrication, making their use in practical on-chip devices difficult.
In this study, we demonstrate a monolithically fabricated plasmonic-waveguide nanolaser. This is the first report showing a non-transfer plasmonic-waveguide nanolaser with a structure size (not only the mode size) in the sub-wavelength regime. A plasmonic waveguided mode capable of sustaining lasing is carefully designed so that top-down fabrication techniques can be used (no need of nanostructure transfer) to simultaneous fabricate the nanolasers together with waveguides for an optical circuit. Moreover, the design supports a lasing mode with a large effective area and confines the absorption of the pump light to the area in which the plasmonic-waveguide mode is most intense, reducing the lasing threshold. Lasing up to room temperature with a low threshold intensity of 0.20 mJ/cm^2 is demonstrated.
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