The MicroBeam NanoFix-50 photomask repair system and the NanoFab-150 nanolithography system are advanced focused ion beam systems which can produce highintensity beams having current densities exceeding 5A/cm2. When such a high current density beam interacts with a solid, significant sputtering, heating, and implantation result. Localized power densities up to 750kW/cm2 can be present. In addition, ambient gas molecules impact the surface under bombardment, interacting physically and chemically, modifying the top atomic layers of the solid. The conditions at the beam impact point are thus extreme and complex.
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