Synchrotron X-ray Lithography System Using A Compact Source

Toyoki Kitayama; Toa Hayasaka; Hideo Yoshihara; Sunao Ishihara

doi:10.1117/12.968524

1 August 1989 Synchrotron X-ray Lithography System Using A Compact Source

Toyoki Kitayama, Toa Hayasaka, Hideo Yoshihara, Sunao Ishihara

Proceedings Volume 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII; (1989) https://doi.org/10.1117/12.968524
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Synchrotron radiation x-rays are effective and powerful sources for x-ray lithography when semiconductor feature size is less than a half micron. A compact synchrotron radiation ring comprising superconducting magnets was developed as an x-ray lithography source. An x-ray exposure system, including a beam line and a vertical stepper, was also developed. Several test exposures confirmed that this synchrotron lithography system is applicable to quarter-micron x-ray lithography.

Citation Download Citation

Toyoki Kitayama, Toa Hayasaka, Hideo Yoshihara, and Sunao Ishihara "Synchrotron X-ray Lithography System Using A Compact Source", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968524

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