Strategies For A Universal Marker Search System For A-Beam Lithography

R. J. M. van Vucht; R. F. L. van der Ven

doi:10.1117/12.968517

1 August 1989 Strategies For A Universal Marker Search System For A-Beam Lithography

R. J. M. van Vucht, R. F. L. van der Ven

Proceedings Volume 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII; (1989) https://doi.org/10.1117/12.968517
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

An enhanced marker search subsystem for the Philips Beamwriter is able to register markers with arbitrary shapes and backscatter profiles. Accuracy down to 10 nm (3σ) is obtainable within search times of typically 200 ms for small area searches. The system is particularly aimed at high reliability and minimal beam-on time per search. To that end, it can choose the optimum algorithm from a number of available algorithms according to marker type and various other parameters. The algorithms belong to two classes: level search and correlation algorithms. Special features of these algorithms are described and their performance is compared for the case of a rectangular heavy metal marker. The level search algorithms are found to be favourable for that marker type in many situations.

Citation Download Citation

R. J. M. van Vucht and R. F. L. van der Ven "Strategies For A Universal Marker Search System For A-Beam Lithography", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968517

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