Rapid Optimization Of The Lithographic Process Window

Christopher P. Ausschnitt

doi:10.1117/12.953140

25 July 1989 Rapid Optimization Of The Lithographic Process Window

Christopher P. Ausschnitt

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953140
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

We address here the optimization of the photolithographic process for submicron design rules. We describe a new method to determine the exposure-focus window corresponding to a user-specified design rule. The change in size and position of the window with changes in design rule, and in process and equipment variables, is the basis for optimization. We describe the implementation of our optimization approach in the MONO-LITH 11/88 Workstation; a computer aided engineering tool that standardizes data acquisition, analysis and presentation, independent of metrology or sampling approach.

Citation Download Citation

Christopher P. Ausschnitt "Rapid Optimization Of The Lithographic Process Window", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953140

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