New Stepper For Large-Area Lithography

David S. Holbrook; Mark S. Lucas; Arthur E. Purcell

doi:10.1117/12.953148

25 July 1989 New Stepper For Large-Area Lithography

David S. Holbrook, Mark S. Lucas, Arthur E. Purcell

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953148
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The need for large substrate, high-throughput, lithographic tools has led to the development of the MRS 4500 PanelPrinter. This new stepper combines image field stitching technology with a long-travel, air-bearing stage to achieve four micrometer (μm) design rules over a 450 by 450 millimeter substrate. In order to produce sufficient throughput, the PanelPrinter utilizes a novel architecture which employs multiple optical projection systems to create a single, large-area image. This paper presents a description of the PanelPrinter's system architecture and provides performance data to illustrate resolution, image distortion, and overlay performance on large-area images. Special emphasis is given to the on-board metrology systems which provide the stability and precision required to perform large scale lithography.

Citation Download Citation

David S. Holbrook, Mark S. Lucas, and Arthur E. Purcell "New Stepper For Large-Area Lithography", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953148

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