New I-Line Lenses

Setha G. Olson

doi:10.1117/12.953146

25 July 1989 New I-Line Lenses

Setha G. Olson

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953146
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

As the semiconductor industry presses toward smaller and smaller feature sizes, new lenses with higher numerical apertures are being introduced. As more chipmakers purchase i-line steppers, the resist makers have developed new resists to exploit them. This paper will show experimental results from two new lenses offered by GCA using new, as well as established, i-line resists.

Citation Download Citation

Setha G. Olson "New I-Line Lenses", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953146

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