Modeling Of Optical Alignment Images For Semiconductor Structures

Chi-Min Yuan; Jerry Shaw; William Hopewell

doi:10.1117/12.953167

25 July 1989 Modeling Of Optical Alignment Images For Semiconductor Structures

Chi-Min Yuan, Jerry Shaw, William Hopewell

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953167
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The "wave-guide" model which can be used to study the light scattering problem in optical alignment, has been extended to include illumination with arbitrary polarization and large numerical aperture (NA) lens. An existing simulator has been enhanced to calculate the images of different structures observed under different alignment schemes. It is shown that variations in the polarization conditions and topography may drastically alter the alignment results.

Citation Download Citation

Chi-Min Yuan, Jerry Shaw, and William Hopewell "Modeling Of Optical Alignment Images For Semiconductor Structures", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953167

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