Displacement Interferometer with High Resolution and Low Sensitivity to Temperature

Kenneth J. Wayne

doi:10.1117/12.953115

19 July 1989 Displacement Interferometer with High Resolution and Low Sensitivity to Temperature

Kenneth J. Wayne

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953115
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The continuing trend toward smaller geometries in IC lithography is placing increased demands on the displacement transducers used in wafer steppers and inspection machines. Among the needs are improved accuracy, repeatability and resolution. This paper describes a new displacement measuring interferometer which has resolution twice that of conventional plane mirror interferometers as well as improved accuracy and repeatability. These improvements are achieved by double passing the measurement arm and optically compensating the thermal drift error inherent in other plane mirror interferometer designs. This drift arises from small changes in ambient temperature and if not eliminated can be significant even in a temperature controlled environment. The origin of thermal drift error in plane mirror interferometers is analyzed and comparative test results are discussed.

Citation Download Citation

Kenneth J. Wayne "Displacement Interferometer with High Resolution and Low Sensitivity to Temperature", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953115

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