Study of the linewidth measurement with scanning electron microscope based on laser interference principle

Bohua Yin; Mingzhang Chu; Guanglu Xu; Xue Li; Junbiao Liu; Daixie Chen; Han Li; Chao Jiang; Xiaoyong Cai

doi:10.1117/12.2505766

24 January 2019 Study of the linewidth measurement with scanning electron microscope based on laser interference principle

Bohua Yin, Mingzhang Chu, Guanglu Xu, Xue Li, Junbiao Liu, Daixie Chen, Han Li, Chao Jiang, Xiaoyong Cai

Author Affiliations +

Proceedings Volume 10840, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics; 108400U (2019) https://doi.org/10.1117/12.2505766
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

As an imaging tool of nanometer resolution for microstructure analysis, the scanning electron microscope plays an important role in semiconductor and nanometer structure measurement. In this study, a special scanning electron microscopy imaging and line width measuring method is introduced based on principle of laser interference. We design the double stages including micron resolution stage and nanometer resolution stage. A new imaging mode by raster scanning of precision stage is employed in this metrological scanning electron microscope. The line width of standard sample image is measured precisely by calculating the coordination data that come from the laser interferometer system. This nanostructure measuring method is in line with international standard for the dimension measurement of traceability.

Citation Download Citation

Bohua Yin, Mingzhang Chu, Guanglu Xu, Xue Li, Junbiao Liu, Daixie Chen, Han Li, Chao Jiang, and Xiaoyong Cai "Study of the linewidth measurement with scanning electron microscope based on laser interference principle", Proc. SPIE 10840, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Micro- and Nano-Optics, Catenary Optics, and Subwavelength Electromagnetics, 108400U (24 January 2019); https://doi.org/10.1117/12.2505766

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Scanning electron microscopy

Metrology

Digital signal processing

Interferometers

Electron microscopes

Image processing

Semiconductors

Show All Keywords

Keywords/Phrases

Search In:

Publication Years