Paper
22 May 2018 Nanoimprinted sol-gel materials for antireflective structures on silicon solar cells
L. Stevens, H. Hauser, O. Höhn, N. Tucher, C. Wellens, R. Jahn, W. Glaubitt, C. Müller, B. Bläsi
Author Affiliations +
Abstract
Silicon solar cells are typically textured by means of wet chemical etching in order to enhance absorption. Within this work, we apply an optically functional layer onto a planar silicon surface. This layer is made of a high refractive index sol-gel material and can be patterned by nanoimprint lithography (NIL). In first experiments, we investigated various sol-gel based TiO2 precursors and evaluated their refractive index as well as the possibility to apply them in NIL. The refractive index was determined to be up to 2.25 using ellipsometry. This result was achieved with a solution composed of amorphous TiO2 precursors mixed with ethanol and 1,5-pentanediol. The topography of the patterned TiO2 layers were investigated using an atomic force microscope (AFM) and a scanning electron microscope (SEM) revealing a period of 1 μm and a pattern depth of 60 nm after sintering. Furthermore, optical modeling was used to optimize the structure parameters in order to minimize the weighted reflectance of an encapsulated silicon solar cell.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. Stevens, H. Hauser, O. Höhn, N. Tucher, C. Wellens, R. Jahn, W. Glaubitt, C. Müller, and B. Bläsi "Nanoimprinted sol-gel materials for antireflective structures on silicon solar cells", Proc. SPIE 10688, Photonics for Solar Energy Systems VII, 106880B (22 May 2018); https://doi.org/10.1117/12.2309935
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Sol-gels

Reflection

Silicon

Refractive index

Antireflective coatings

Silicon solar cells

Nanoimprint lithography

Back to Top